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1 article(s) from Janda, Pavel

Atomic layer deposited films of Al₂O₃ on fluorine-doped tin oxide electrodes: stability and barrier properties

Hana Krýsová,
Michael Neumann-Spallart,
Hana Tarábková,
Pavel Janda,
Ladislav Kavan and
Josef Krýsa

Beilstein J. Nanotechnol. 2021, 12, 24–34, doi:10.3762/bjnano.12.2

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Figure 1: AFM topography image (10 µm × 10 µm) of an FTO substrate (left) and of an FTO substrate coated with...

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Figure 2: CVs of 0.5 mM K₃[Fe(CN)₆] and 0.5 mM K₄[Fe(CN)₆] in 0.5 M KCl on FTO electrodes covered with Al₂O₃ ...

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Figure 3: CVs of 0.5 mM K₃[Fe(CN)₆] and 0.5 mM K₄[Fe(CN)₆] in 0.5 M KCl demonstrating the blocking properties...

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Figure 4: CVs of 0.5 mM K₃[Fe(CN)₆] and 0.5 mM K₄[Fe(CN)₆] in 0.5 M KCl demonstrating the blocking properties...

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Figure 5: Si wafer coated with an Al₂O₃ film (17 nm) after exposure to 1 M NaOH for 1h. (a) Optical microscop...

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Figure 6: CVs of 0.5 mM K₃[Fe(CN)₆] and 0.5 mM K₄[Fe(CN)₆] in 0.5 M KCl demonstrating blocking properties of ...

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Figure 7: CVs in the presence of 0.5 mM K₃[Fe(CN)₆] and 0.5 mM K₄[Fe(CN)₆] in 0.5 M KCl. Blocking properties ...

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Figure 8: Chronoamperometry in buffered solution (pH 7.2). Comparison of bare FTO (blue) and FTO covered with...

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Figure 9: XRD patterns of samples polarized at −1.2 V vs Ag/AgCl in buffer (pH 7.2) for 5 h. Red trace: FTO, ...

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Published 05 Jan 2021

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Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

Atomic layer deposited films of Al₂O₃ on fluorine-doped tin oxide electrodes: stability and barrier properties